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Proceedings Paper

Methods used to streamline data preparation for memory products
Author(s): Paul DePesa; Wolfgang Leitermann
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Paper Abstract

Historically the transcription of design data, in preparation for mask manufacture, has been to produce flat exposure tool data. Recent developments in hierarchical fracturing in the CATSTM tool are reviewed and explained. Current design data, especially memory products or even microprocessors containing cache, benefit immensely from these developments. The pertinent CATSTM commands are reviewed. Records of typical data fractures are presented and reviewed, showing the overall decrease in CPU usage with the hierarchal methods. The concomitant decrease in file sizes is also shown.

Paper Details

Date Published: 22 January 2001
PDF: 7 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410685
Show Author Affiliations
Paul DePesa, Transcription Enterprises, Inc. (United States)
Wolfgang Leitermann, Xilinx, Inc. (United States)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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