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Proceedings Paper

High-accuracy laser mask repair system LM700A
Author(s): Yoichi Yoshino; Yukio Morishige; Shuichi Watanabe; Yukio Kyusho; Atsushi Ueda; Tutomu Haneda; Makoto Ohmiya
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Paper Abstract

High throughput laser mask repair system satisfying the accuracy demanded for 0.5 jum pattern rule reticles has been newly developed. The named Laser Mask Repair LM700A has the following features: ? Opaque defect repair capability of 0.5 ?m L&S patterns ? High repair accuracy of 45 nm (3 sigma) ? Quartz damage depth of less than 20nm ? Transmission at the repair site of more than 96% ? Pico-second solid state UV pulse laser and high resolution UV Optics Laser wavelength : 351 nm Laser pulse duration : less than 300 ps Observation wavelength : 365 nm By utilizing a pico-second UV pulse laser, very high quality laser zapping can be obtained. This paper presents the configuration and the evaluated results for mask repair performance in conventional Cr binary masks.

Paper Details

Date Published: 22 January 2001
PDF: 7 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410680
Show Author Affiliations
Yoichi Yoshino, NEC Corp. (Japan)
Yukio Morishige, NEC Corp. (Japan)
Shuichi Watanabe, NEC Corp. (United States)
Yukio Kyusho, NEC Corp. (Japan)
Atsushi Ueda, NEC Corp. (Japan)
Tutomu Haneda, NEC Corp. (Japan)
Makoto Ohmiya, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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