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Proceedings Paper

Investigating inspectability and printability of contamination deposited during SEM analysis
Author(s): Bryan S. Kasprowicz; Mohan Ananth; Chih-Yu Wang
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Paper Abstract

The effects on pattern fidelity of material deposition on photomasks due to interactions of the primary electrons with the organic molecules contained in the vacuum chamber while being analyzed in CD SEM were investigated. The photomasks experienced contamination in the area that was electron-irradiated by the SEM, but it was not detected with either a transmitted or reflected light inspection. Wafers were exposed at various illumination conditions and at multiple wavelengths, which produced no noticeable effects on the images as compared to unanalyzed locations.

Paper Details

Date Published: 22 January 2001
PDF: 9 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410674
Show Author Affiliations
Bryan S. Kasprowicz, Photronics, Inc. (United States)
Mohan Ananth, KLA-Tencor Corp. (United States)
Chih-Yu Wang, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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