Share Email Print
cover

Proceedings Paper

Automated alignment scheme for in-line defect data
Author(s): Julie Segal; Tom T. Ho; Arman Sagatelian
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Memories are especially convenient for defect analysis and yield improvement studies because large portions of a memory die are arrange din a regular array that is connected for external testing in such a manner as to facilitate determination of the physical location of failing memory elements. It is frequently desirable to compare the physical location of failing elements with the location of defects identified with in-line inspection equipment as well as to compare the locations of in-line defects identified on different process layers. This process of comparison is often referred to as creating overlay plots, or frequently just overlays. A practical obstacle to the creation of overlays is that the absolute position of locations on wafers is not accurate in typical inspection equipment with the result there are offsets between the same defect as it propagates between layers and between the reported defect location and resultant location of failing bits on a die.

Paper Details

Date Published: 23 August 2000
PDF: 9 pages
Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); doi: 10.1117/12.410081
Show Author Affiliations
Julie Segal, Heuristic Physics Labs. (United States)
Tom T. Ho, Heuristic Physics Labs. (United States)
Arman Sagatelian, Heuristic Physics Labs. (United States)


Published in SPIE Proceedings Vol. 4182:
Process Control and Diagnostics
Michael L. Miller; Kaihan A. Ashtiani, Editor(s)

© SPIE. Terms of Use
Back to Top