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Proceedings Paper

Feed-forward control for a lithography/etch sequence
Author(s): Richard Oechsner; Thomas Tschaftary; Stefan Sommer; Lothar Pfitzner; Heiner Ryssel; Harald Gerath; Christine Baier; Martin Hafner
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Paper Abstract

Feed-forward and feedback control are used to compensate for variations caused by processes or equipment. The variations may be due to e.g. aging or shift and they may occur within a single process step or within a process sequence. The application of advanced process control methods offer the possibility to reduce deviation of process centering and, therefore, improving process capability. In this work, we investigated the feed-forward concept applied for a lithography/etch sequence to control the deviation of the critical dimension of polysilicon wires and also the implementation of feed-forward control into existing manufacturing execution systems.

Paper Details

Date Published: 23 August 2000
PDF: 9 pages
Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); doi: 10.1117/12.410080
Show Author Affiliations
Richard Oechsner, Fraunhofer Institute of Integrated Circuts (Germany)
Thomas Tschaftary, Fraunhofer Institute of Integrated Circuits (Germany)
Stefan Sommer, Friedrich-Alexander-Univ. Erlangen-Nuremberg (Germany)
Lothar Pfitzner, Fraunhofer Institute of Integrated Circuits (Germany)
Heiner Ryssel, Fraunhofer Institute of Integrated Circuits (Germany) and Friedrich-Alexander Institute of (Germany)
Harald Gerath, Philips Semiconductors SMST GmbH (Germany)
Christine Baier, Philips Semiconductors SMST GmbH (Germany)
Martin Hafner, Philips Semiconductors SMST GmbH (Germany)


Published in SPIE Proceedings Vol. 4182:
Process Control and Diagnostics
Michael L. Miller; Kaihan A. Ashtiani, Editor(s)

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