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Proceedings Paper

Fabrication of microlens arrays with long focus for improving responsivity of PtSi IR detector array device
Author(s): Sihai Chen; Miao He; Xinjian Yi; Xinyu Zhang
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Paper Abstract

For the first time, diffractive rectangle-based multilevel steps Si microlens arrays are fabricated by a new method, named part etching. The new method proposed can increase focal length of diffractive microlenses arrays. The 256x256 element microlens arrays are designed for a center wavelength of 4micrometers , with 40micrometers (Horizontal) x 30micrometers (Vertical) quadrate pixel dimension and a speed (F number) of F/2.53 (in air). The focal length of the microlens array is 400micrometers in Si material, much longer than focal length of the microlens arrays of the same size fabricated by conventional binary optics method. The method also includes photolithography and ion beam milling process. The 256x256 element microlens arrays and the same 256x256 element PtSi IR Focal Plan Arrays (FPAs) are monolithic integrated on the same wafer. The IR response characteristics of the integration device are improved greatly.

Paper Details

Date Published: 15 December 2000
PDF: 9 pages
Proc. SPIE 4130, Infrared Technology and Applications XXVI, (15 December 2000); doi: 10.1117/12.409867
Show Author Affiliations
Sihai Chen, Huazhong Univ. of Science and Technology (China)
Miao He, Huazhong Univ. of Science and Technology (China)
Xinjian Yi, Huazhong Univ. of Science and Technology (China)
Xinyu Zhang, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 4130:
Infrared Technology and Applications XXVI
Bjorn F. Andresen; Gabor F. Fulop; Marija Strojnik, Editor(s)

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