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Structural, infrared, x-ray photoelectron, and Raman spectral characterization of electrochromic nickel oxide films
Author(s): Yonggang Wu; Guangming Wu; Xingyuan Ni; Xiang Wu
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Paper Abstract

Nickel oxide films were deposited onto indium-tin oxide coated substrates by electron-beam evaporation and were electrochemically colored and bleached in KOH electrolyte. X-ray diffraction, infrared, x-ray photoelectronic and Raman spectroscopy were used to characterize the films. Results show that the as-deposited films are composed of crystallites with preferential orientation of cubic NiO(111), and retain their original structure after electrochromic redox reaction. The boundary and surface of the NiO crystallites play a critical role in the electrochromic reaction, the sites of the injection and ejection of OH- ions and relevant electrochromic reaction are at the interface of NiO crystallites, the major composition at the interfaces of the crystallites are NiO for the as-deposited films, NiOOH for the colored films and Ni(OH)2 for the bleached films.

Paper Details

Date Published: 29 November 2000
PDF: 5 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408487
Show Author Affiliations
Yonggang Wu, Tongji Univ. (China)
Guangming Wu, Tongji Univ. (China)
Xingyuan Ni, Tongji Univ. (China)
Xiang Wu, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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