Share Email Print
cover

Proceedings Paper

Influence of hydrogen plasma processing on gas-sensitive tin dioxied thin film properties
Author(s): Igor A. Karapatnitski; Konstantin A. Mit'; Daniya M. Mukhamedshina; Grigory G. Baikov
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The influence of glow discharge hydrogen plasma processing on undoped tin dioxide (SnO2) thin film structure and properties have been investigated. The films of 150 - 200 nm thickness were deposited by a method of magnetron sputtering on Al2O3 substrate at the temperature of this one 250 degree(s)C with a rate of 1.5 - 2.0 nm/min in argon-oxygen mixture atmosphere. It was shown these films are amorphous just after fabrication, theirs polycrystalline structure appears after annealing and disappears after processing in the hydrogen plasma. Such a processing expands a temperature range of film sensitivity to ethanol and heptane vapors, increases the sensitivity to low concentration of those.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408464
Show Author Affiliations
Igor A. Karapatnitski, Ministry of Education & Science (Kazakhstan)
Konstantin A. Mit', Ministry of Education & Science (Kazakhstan)
Daniya M. Mukhamedshina, Ministry of Education & Science (Kazakhstan)
Grigory G. Baikov, Ministry of Education & Science (Kazakhstan)


Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

© SPIE. Terms of Use
Back to Top