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Proceedings Paper

Influence of hydrogen plasma processing on gas-sensitive tin dioxied thin film properties
Author(s): Igor A. Karapatnitski; Konstantin A. Mit'; Daniya M. Mukhamedshina; Grigory G. Baikov
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Paper Abstract

The influence of glow discharge hydrogen plasma processing on undoped tin dioxide (SnO2) thin film structure and properties have been investigated. The films of 150 - 200 nm thickness were deposited by a method of magnetron sputtering on Al2O3 substrate at the temperature of this one 250 degree(s)C with a rate of 1.5 - 2.0 nm/min in argon-oxygen mixture atmosphere. It was shown these films are amorphous just after fabrication, theirs polycrystalline structure appears after annealing and disappears after processing in the hydrogen plasma. Such a processing expands a temperature range of film sensitivity to ethanol and heptane vapors, increases the sensitivity to low concentration of those.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408464
Show Author Affiliations
Igor A. Karapatnitski, Ministry of Education & Science (Kazakhstan)
Konstantin A. Mit', Ministry of Education & Science (Kazakhstan)
Daniya M. Mukhamedshina, Ministry of Education & Science (Kazakhstan)
Grigory G. Baikov, Ministry of Education & Science (Kazakhstan)

Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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