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Proceedings Paper

Growth and Si-doping of GaN on GaAs(001) by MBE
Author(s): Q. Huang; Hong Chen; Zhiqiang Li; Hongfei Liu; Junming Zhou
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Paper Abstract

The GaN growth and Si-doped GaN are studied in this work. By means of x-ray diffraction and photoluminescence (PL) measurements we found that the GaN sample directly grown on GaAs substrate is pure cubic phase and that grown on AlAs buffer is pure hexagonal phase. The present study shows that the phase of GaN samples grown on GaAs substrates can be controlled using different buffer layers. The PL properties of Si-doped cubic GaN with different carrier concentrations were investigated at room temperature. It was found that when the carrier concentration is increased from 5 X 1015 to 2 X 1018cm-3, the PL peak shifted towards low energy, from 3.246 to 3.227 eV, and the PL linewidth increased from 77.1 to 121 meV. The PL peak shift is explained by the bandgap narrowing effect due to the high doping concentration. The PL linewidth includes two parts: one is doping concentration-independent, which is caused by the imperfection of samples and phonon scattering; the other is doping concentration-dependent. We assign the second part to the broadening by the microscopic fluctuation of the doping concentration. The experimental measurements are in good agreement with the model.

Paper Details

Date Published: 29 November 2000
PDF: 5 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408461
Show Author Affiliations
Q. Huang, Institute of Physics (China)
Hong Chen, Institute of Physics (China)
Zhiqiang Li, Institute of Physics (China)
Hongfei Liu, Institute of Physics (China)
Junming Zhou, Institute of Physics (China)

Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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