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Proceedings Paper

Refractive index measurement for planar photonic crystal using a microscopy-spectrometry method
Author(s): Mike Xu Ouyang; Emmanuel C. Onyiriuka; L. D. Kinney
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Paper Abstract

We report a unique technique to measure the refractive index (n), extinction coefficient (k), and thickness of thin films based on either the reflection or transmission spectra. The method combines a spectrometer, an optical microscope and a video camera. It is inexpensive, versatile and fast (< a few sec). Using this technology, n&k of 1.68 and 0.376, respectively, at 1500 nm was measured on a planar photonic crystal. The photonic crystal with a dimension of 117 X 90 micrometers 2 mm has a periodic cermet structure on Si substrate made by Deutsch Telekom using the electron induced deposition.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408415
Show Author Affiliations
Mike Xu Ouyang, Corning Inc. (United States)
Emmanuel C. Onyiriuka, Corning Inc. (United States)
L. D. Kinney, Corning Inc. (United States)

Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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