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Proceedings Paper

Co-diffusion thin layer of phosphorus and boron for preparation of silicon BSF solar cell
Author(s): Wan-Tao Yu; Guang-Pu Wei
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Paper Abstract

Co-diffusion processing is emerging as a promising simplified process for manufacture of terrestrial back surface field (BSF) solar cells. In this work, we present results about co-diffusion of two dopant elements (phosphorus and boron) in a single thermal cycle in order to form emitter and BSF thin layer simultaneously. According to the measured sheet resistance, it was found that uniform, stable and controllable diffusion layers on front and back surface of silicon wafer can be obtained with co-diffusion method. Using the co-diffusion method, some silicon BSF solar cells with an efficient of more than 12% (at AM1) were prepared. The measurement results of minority carrier lifetime show that boron diffusion in back side of silicon wafer has a gettering effect on the p-n junction area and can improve the characteristics of solar cells.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408413
Show Author Affiliations
Wan-Tao Yu, Shanghai Univ. (China)
Guang-Pu Wei, Shanghai Univ. (China)


Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications

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