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Proceedings Paper

Simulation study of multiple acceptable models existing in the interpretation of ellipsometric data
Author(s): Wensheng Guo
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Paper Abstract

Ellipsometry has been widely used in the measurements of thin film thickness and optical properties. The existence of multiple acceptable models has been confirmed in the interpretation of the measured ellipsometric data, which can degrade the measurement accuracy. How to eliminate this ambiguity is very important. In the present paper, we apply a simulation method to study the existence of multiple acceptable models and to seek the methods to alleviate such kinds of ambiguity. In the simulation study, a simple structure model (silicon dioxide film coated on silicon substrate) is used.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408328
Show Author Affiliations
Wensheng Guo, Sichuan Univ. (China)


Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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