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Proceedings Paper

Microstructure and infrared optical properties of hydrogenated carbon nitride film
Author(s): Jianhua Ju; Yiben Xia; Weli Zhang; Linjun Wang; Weimin Shi; Zhiming Huang; Z.F. Li; Guozheng Zeng; Dingyuan Tang
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Paper Abstract

Microstructure and optical properties of nitrogen doped hydrogenated carbon (a-C:H:N) film deposited by rf plasma enhanced chemical vapor deposition method were studied by AFM, Raman, FTIR and IRE spectrometer. Absorption intensities of the peaks CNH (1600 cm-1), CN (2200 cm-1) and NH (3250 cm-1) in the IR spectra increase with the ratio of flux N2/CH4. Raman spectra show the shape of D and G band of a-C:H:N film varies slightly with the increase of N content, which means the main structures of N doped films are still diamondlike carbon films. However Gaussian fit results show that G band widens and the peak shifts to the low wavenumber in Raman spectra is that amorphous C3N4 structure formed in the film. AFM topographies and LFM images of a-C:H:N film confirm the amorphous C3N4 exists as several ten nanometers particles in the film. IRE spectra analysis results show that refractive index of the film in infrared band (2 - 14 um) slightly decreases from 1.8 to 1.6 with increased nitrogen content in the films.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408324
Show Author Affiliations
Jianhua Ju, Shanghai Univ. and Shanghai Institute of Technical Physics (China)
Yiben Xia, Shanghai Univ. and Shanghai Institute of Technical Physics (China)
Weli Zhang, Shanghai Univ. (China)
Linjun Wang, Shanghai Univ. (China)
Weimin Shi, Shanghai Univ. (China)
Zhiming Huang, Shanghai Institute of Technical Physics (China)
Z.F. Li, Shanghai Institute of Technical Physics (China)
Guozheng Zeng, Shanghai Institute of Technical Physics (China)
Dingyuan Tang, Shanghai Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications

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