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Proceedings Paper

Diamond film: a promising passivation film of porous silicon
Author(s): Weimin Shi; Linjun Wang; Yiben Xia; Jianhua Ju; Zhijun Fang; Yaowu Mo
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Paper Abstract

In this paper homogeneous and dense diamond films with good crystalline quality are successfully deposited on porous silicon surfaces by the microwave plasma assisted chemical vapor deposition method. Photoluminescence measurements show that the CVD diamond film-coated porous silicon has a weak shift of emission wavelength as compared with the stored porous silicon without a diamond film, and its PL intensity almost doesn't change with time. It means the diamond film can efficiently stabilize the PL wavelength and intensity of porous silicon and provide a better passivation effect. In addition, due to its well-known high hardness, the CVD diamond film can improve the mechanical strength of PS surface, and is therefore a promising candidate for passivation of porous silicon in the future.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408320
Show Author Affiliations
Weimin Shi, Shanghai Univ. (China)
Linjun Wang, Shanghai Univ. (China)
Yiben Xia, Shanghai Univ. (China)
Jianhua Ju, Shanghai Univ. (China)
Zhijun Fang, Shanghai Univ. (China)
Yaowu Mo, Shanghai Univ. (China)


Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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