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Proceedings Paper

Influence of nitrogen defects in AIN coverlayers on thermal stability of DyFeCo MO films
Author(s): Rui Xiong; Wufeng Tang; Jing Shi; Deichen Tian
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Paper Abstract

Thermal stability of amorphous DyFeCo films covered with non-stoichiometric AlN layer has been investigated. When RE- dominated films were annealed in air for 10 hours at 200 degree(s)C, the Kerr loops showed the characteristic of magnetic double-layered films. This behavior can be interpreted as follows: the reaction of diffusing N with Dy leads to a reduction of the magnetic active Dy content at the interface and created a very thin TM dominated DyFeCo layer between AlN and DyFeCo layer. This interpretation was demonstrated by XPS measurements.

Paper Details

Date Published: 29 November 2000
PDF: 4 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408306
Show Author Affiliations
Rui Xiong, Wuhan Univ. (China)
Wufeng Tang, Wuhan Univ. (China)
Jing Shi, Wuhan Univ. (China)
Deichen Tian, Wuhan Univ. (China)

Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications
Junhao Chu; Pulin Liu; Yong Chang, Editor(s)

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