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Proceedings Paper

Influence of magnetron sputtering CoZrNb stochiometric relation in deposition film
Author(s): Jiliang Zhang; Sanming Xiang; Chunsheng Yang
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Paper Abstract

The experiments of Co89Zr4Nb67 magnetron sputtering showed that the stoichiometric relation in deposited film is obviously different from that in target. The fact that Zr and Nb contents, which have larger atomic mass, in deposited film were more than that in target showed there were different virtual sources of Co, Zr and Nb between target and substrate.

Paper Details

Date Published: 29 November 2000
PDF: 3 pages
Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408303
Show Author Affiliations
Jiliang Zhang, Shanghai Jiao Tong Univ. (China)
Sanming Xiang, Shanghai Jiao Tong Univ. (China)
Chunsheng Yang, Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 4086:
Fourth International Conference on Thin Film Physics and Applications

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