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Proceedings Paper

High-energy femtosecond oscillators and their application for laser ablation of dielectric materials
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Paper Abstract

High-energy oscillators, generating femtosecond pulses at 800 nm and 1250 nm, are demonstrated. These pulses are used for fast-speed laser ablation and material modification of transparent dielectric materials. Sub-micron size features are produced in fused silica by tight focusing of these pulses.

Paper Details

Date Published: 16 August 2000
PDF: 4 pages
Proc. SPIE 4065, High-Power Laser Ablation III, (16 August 2000); doi: 10.1117/12.407394
Show Author Affiliations
Vladislav V. Yakovlev, Univ. of Wisconsin/Milwaukee (United States)


Published in SPIE Proceedings Vol. 4065:
High-Power Laser Ablation III
Claude R. Phipps, Editor(s)

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