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Proceedings Paper

Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability
Author(s): Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Sebastian Oestreich; Edward L. G. Maas; M. J. H. Kessels; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Stefan Muellender; Markus Haidl; Fred Bijkerk
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Paper Abstract

High performance reflective coatings for EUVL projection systems can be produced by using e-beam evaporation in combination with ion beam smoothening of the interfaces. Using this technique, we recently demonstrated a near normal incidence reflectivity of 69.5%. Another, equally important part of the optimization of the coating process is the lateral control of the thickness of the layers, that is the d-spacing of the coating. In this paper we demonstrate the ability to obtain a uniformity of the d-spacing of the coating of better than +/- 0.05% over a 6' area, both on flat and concave surfaces (uniformity specified in terms of wavelength of maximum reflectance). All reflectance measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin.

Paper Details

Date Published: 8 November 2000
PDF: 4 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406676
Show Author Affiliations
Eric Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Andrey E. Yakshin, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Peter C. Goerts, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Sebastian Oestreich, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Edward L. G. Maas, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
M. J. H. Kessels, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Detlef Schmitz, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Stefan Muellender, Carl Zeiss (Germany)
Markus Haidl, Carl Zeiss (Germany)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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