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Proceedings Paper

Present status of the ASET at-wavelength phase-shifting point diffraction interferometer
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Paper Abstract

The precise alignment of Extreme Ultra-Violet Lithography (EUVL) imaging system is necessary in order to achieve diffraction-limited performance. Interferometric testing at the exposure wavelength is needed to ensure proper alignment and to achieve an acceptable final wavefront. We have built a prototype at-wavelength interferometer at the NewSUBARU facility. This interferometer is a phase-shifting point diffraction interferometer (PS/PDI) testing specially constructed Schwarzschild optics. Preliminary experiments using visible light were performed in order to learn this PS/PDI. The Schwarzschild optics were aligned using visible wavefront measurements with the interferometer. The precision of the visible measurements was evaluated. Experiments using EUV radiation have been started.

Paper Details

Date Published: 8 November 2000
PDF: 7 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406675
Show Author Affiliations
Katsumi Sugisaki, Association of Super-Advanced Electronics Technology (Japan)
Yucong Zhu, Association of Super-Advanced Electronics Technology (Japan)
Yoshio Gomei, Association of Super-Advanced Electronics Technology (Japan)
Masahito Niibe, Himeji Institute of Technology (Japan)
Takeo Watanabe, Himeji Institute of Technology (Japan)
Hiroo Kinoshita, Himeji Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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