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Proceedings Paper

Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology
Author(s): Udo Dinger; Frank Eisert; Holger Lasser; Maximilian Mayer; A. Seifert; Guenther Seitz; Siegfried Stacklies; Franz-Josef Stickel; Martin Weiser
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Paper Abstract

In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.

Paper Details

Date Published: 8 November 2000
PDF: 12 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406674
Show Author Affiliations
Udo Dinger, Carl Zeiss (Germany)
Frank Eisert, Carl Zeiss (Germany)
Holger Lasser, Carl Zeiss (Germany)
Maximilian Mayer, Carl Zeiss (Germany)
A. Seifert, Carl Zeiss (Germany)
Guenther Seitz, Carl Zeiss (Germany)
Siegfried Stacklies, Carl Zeiss (Germany)
Franz-Josef Stickel, Carl Zeiss (Germany)
Martin Weiser, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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