Share Email Print
cover

Proceedings Paper

Illumination optics design for EUV lithography
Author(s): Martin Antoni; Wolfgang Singer; Jorg Schultz; Johannes Wangler; Isabel Escudero-Sanz; Bob Kruizinga
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a fly's-eye integrator. A comparison is given and the potentials of the different solutions are outlined.

Paper Details

Date Published: 8 November 2000
PDF: 10 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406673
Show Author Affiliations
Martin Antoni, Carl Zeiss (Germany)
Wolfgang Singer, Carl Zeiss (Germany)
Jorg Schultz, Carl Zeiss (Germany)
Johannes Wangler, Carl Zeiss (Germany)
Isabel Escudero-Sanz, TNO-TPD (Netherlands)
Bob Kruizinga, TNO-TPD (Netherlands)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

© SPIE. Terms of Use
Back to Top