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Proceedings Paper

Trends in optical design of projection lenses for UV and EUV lithography
Author(s): Wilhelm Ulrich; Susanne Beiersdoerfer; Hans-Juergen Mann
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Paper Abstract

The continuing trend towards higher integration density of microelectronic circuits requires steadily decreasing feature sizes. The SIA roadmap defines the technologies needed to meet this challenges. One of the fundamental requirements for lithography with a resolution of 100 nm and below is the development of new high-performance optical designs for projection lenses.

Paper Details

Date Published: 8 November 2000
PDF: 12 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406667
Show Author Affiliations
Wilhelm Ulrich, Carl Zeiss (Germany)
Susanne Beiersdoerfer, Carl Zeiss (Germany)
Hans-Juergen Mann, Carl Zeiss (Germany)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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