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Proceedings Paper

Optical layout of BACH: a beamline for advanced dichroism at Elettra
Author(s): Marco Zangrando; Marco Finazzi; Fulvio Parmigiani; G. Paolucci; Daniele Cocco
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Paper Abstract

Here we report the general layout of the beamline and concentrate our attention on the characteristics of the optical elements as well as on the optical performances (monochromator's resolving powers and efficiencies, flux and spot dimensions) of the beamline.

Paper Details

Date Published: 8 November 2000
PDF: 11 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406665
Show Author Affiliations
Marco Zangrando, Lab. Nazionale de Tecnologie Avanzate Superfici e Catalisi/INFM (Italy)
Marco Finazzi, Lab. Nazionale de Tecnologie Avanzate Superfici e Catalisi/INFM (Italy)
Fulvio Parmigiani, Univ. Cattolica/INFM (Italy)
G. Paolucci, Sincrotrone Trieste (Italy)
Daniele Cocco, Sincrotrone Trieste (Italy)

Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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