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Proceedings Paper

Portable diagnostics for EUV light sources
Author(s): R. Stuik; Raluca C. Constantinescu; Petra Hegeman; Jeroen Jonkers; H. F. Fledderus; Vadim Banine; Fred Bijkerk
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Paper Abstract

The EUV light source is a critical factor for the success of Extreme Ultraviolet Lithography (EULV), ASML, FOM and Philips Research have developed a portable set of diagnostics for the characterization of candidate EUV sources, called Flying Circus. The set of diagnostics is used to perform the following measurements: Absolute EUV power measurements, pulse-to-pulse intensity fluctuations, plasma size and shape, size/shape/positional stability, spectral distribution of radiation and stability, timing jitter and contamination by the source. These measurements are to be performed on-site, at the laboratories of the different source developers. The design as well as the first calibration measurements performed by the Flying Circus on the FOM Xe double gas jet source and on the PLEX z-pinch source will be discussed.

Paper Details

Date Published: 8 November 2000
PDF: 7 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406663
Show Author Affiliations
R. Stuik, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Raluca C. Constantinescu, Philips Research Labs. (Netherlands)
Petra Hegeman, Philips Research Labs. (Netherlands)
Jeroen Jonkers, Philips Research Labs. (Germany)
H. F. Fledderus, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Vadim Banine, ASML (Netherlands)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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