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Proceedings Paper

Laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry
Author(s): Raluca C. Constantinescu; Jeroen Jonkers; Petra Hegeman; Matthieu Visser
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Paper Abstract

A laser-generated water plasma source has been built, operating around-the-clock. We characterized this source looking at several aspects that are important for a possible EUV source to be used in a next-generation lithographic tool. We characterized the source spectrally, measured the size of the source, the angular dependence of the EUV emission and the temporal dependence of the EUV pulses. We also investigated the level of debris produced by the source and the contamination of EUV optics by the water plasma. Finally, this laser-generated water plasma has been successfully used in a shearing interferometer, in which the imaging equality of EUV optics can be assessed accurately at-wavelength.

Paper Details

Date Published: 8 November 2000
PDF: 12 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406661
Show Author Affiliations
Raluca C. Constantinescu, Philips Research Labs. (Netherlands)
Jeroen Jonkers, Philips Research Labs. (Germany)
Petra Hegeman, Philips Research Labs. (Netherlands)
Matthieu Visser, Philips Research Labs. (Netherlands)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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