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Proceedings Paper

DUV or EUV: that is the question
Author(s): David M. Williamson
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Paper Abstract

Lord Rayleigh's well-known equations for resolution and depth of focus indicate that resolution is better improved by reducing the wavelength of light rather than by increasing the numerical aperture (NA) of the projection optics, particularly when NA is approaching its physical limit of 1.0 in air (or vacuum). Vector aerial image simulations of diffraction-limited Deep Ultraviolet (DUV) and Extreme Ultraviolet (EUV) lithographic systems verify this simple view, even though Rayleigh's constants in Microlithography are not constant because of a variety of image enhancement techniques that attempt to compensate for the shortcomings of the aerial image when it is pushed to the limit. The aerial image is not the whole story, however. The competition between DUV and EUV systems will be decided more by economic and technological factors such as risk, time and cost of development and cost of ownership. These in turn depend on cost, availability and quality of light sources, refracting materials, photoresists and reticles.

Paper Details

Date Published: 8 November 2000
PDF: 12 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406659
Show Author Affiliations
David M. Williamson, Silicon Valley Group, Inc. (United Kingdom)


Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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