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Proceedings Paper

Role of photomask resolution on the performance of arrayed-waveguide grating devices
Author(s): Wei Chen; Chau-Han Lee; Qiang Wang; Yung Jui Chen; Warren T. Beard; Dennis Stone; Robert F. Smith; Rod Mincher; Ian R. Stewart
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Paper Abstract

The crosstalk performance of an arrayed-waveguide grating (AWG) multi-/demultiplexer is primarily caused by random optical phase errors introduced in the arrayed-waveguides. Since the layout of waveguides on a wafer is patterned by photomask through photolithography process, the resolution of a photomask has a direct influence on the phase errors of an AWG. This paper presents a theoretical analysis on the phase error caused by photomask resolution along with other basic design parameters. Both calculation and measurement results show that a high-resolution photomask (better than 25 nm) is a critical requirement to produce low-crosstalk (less than -30 dB) AWG demultiplexers. We also investigated the non-ideal power distribution in the array waveguides since it contributes considerable phase errors when material impurity is not well controlled during wafer fabrication. Basic criteria of power profile truncation, number of grating waveguides, and material index variation are summarized in this paper as well.

Paper Details

Date Published: 15 December 2000
PDF: 10 pages
Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000); doi: 10.1117/12.406412
Show Author Affiliations
Wei Chen, Univ. of Maryland/Baltimore County (United States)
Chau-Han Lee, Univ. of Maryland/Baltimore County (United States)
Qiang Wang, Univ. of Maryland/Baltimore County (United States)
Yung Jui Chen, Univ. of Maryland/Baltimore County (United States)
Warren T. Beard, Lab. for Physical Sciences (United States)
Dennis Stone, Lab. for Physical Sciences (United States)
Robert F. Smith, Dept. of Defense (United States)
Rod Mincher, Dept. of Defense (United States)
Ian R. Stewart, Dept. of Defense (United States)


Published in SPIE Proceedings Vol. 4087:
Applications of Photonic Technology 4
Roger A. Lessard; George A. Lampropoulos, Editor(s)

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