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Proceedings Paper

Development of an EUV reflectometer using a laser plasma x-ray source
Author(s): Hiroyuki Kondo; Noriaki Kandaka; Katsumi Sugisaki; Tetsuya Oshino; Masayuki Shiraishi; Wakana Ishiyama; Katsuhiko Murakami
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Paper Abstract

In order to evaluate the performance of multilayer optics, we have successfully developed a simple, laboratory-sized reflectometer that can be operated readily on a routine basis. This reflectometer makes use of a single line emission at the wavelength of 12.98 nm from a CO2 gas-jet laser-plasma x-ray source that can be readily operated on a routine basis. Our reflectometer achieved repeatability of less than +/- 0.8% in reflectivity measurements. The peak reflectivity of a sample determined by calculation based on multilayer mirror parameters obtained from our reflectometer was within +/- 1.3% of that obtained by an SR-based reflectometer. These results confirm that our reflectometer performs well enough to evaluate multilayer optics.

Paper Details

Date Published: 2 November 2000
PDF: 6 pages
Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); doi: 10.1117/12.405906
Show Author Affiliations
Hiroyuki Kondo, Nikon Corp. (Japan)
Noriaki Kandaka, Nikon Corp. (Japan)
Katsumi Sugisaki, Nikon Corp. (Japan)
Tetsuya Oshino, Nikon Corp. (Japan)
Masayuki Shiraishi, Nikon Corp. (Japan)
Wakana Ishiyama, Nikon Corp. (Japan)
Katsuhiko Murakami, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 4144:
Advances in Laboratory-based X-Ray Sources and Optics
Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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