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Proceedings Paper

High-uniformity collimator for x-ray proximity lithography
Author(s): Webster C. Cash
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Paper Abstract

An x-ray optic suitable for use in x-ray proximity lithography is described. It employs multiple flat mirror facets arranged at grazing incidence, each of which creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. We report laboratory testing that shows uniformity better than +/- 0.4% across 40 mm at 1 keV.

Paper Details

Date Published: 2 November 2000
PDF: 10 pages
Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); doi: 10.1117/12.405897
Show Author Affiliations
Webster C. Cash, Xmetrics, Inc. and Univ. of Colorado/Boulder (United States)


Published in SPIE Proceedings Vol. 4144:
Advances in Laboratory-based X-Ray Sources and Optics
Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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