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Proceedings Paper

Fast-scanning ellipsometry for thin film characterization
Author(s): Christopher Berge; Anna Krasilnikova; Enrico Masetti
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Paper Abstract

We present an ellipsometric measurement set up designed for fast surface mapping. The system consists of a HeNE laser, a linear polarizer, a recently developed grating polarimeter and a translation stage for moving the sample. The system allows the spatially resolved measurement of the ellipsometric angles (Delta) and (Psi) . For transparent single layer coating, refractive index and film thickness from the measured values can be calculated. For multilayer coatings where the determination of all the optical properties is not possible, information on the coating homogeneity can be gained.

Paper Details

Date Published: 2 November 2000
PDF: 7 pages
Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); doi: 10.1117/12.405833
Show Author Affiliations
Christopher Berge, ENEA Thin Films Optics Lab. (Germany)
Anna Krasilnikova, Moscow State Univ. (Russia)
Enrico Masetti, ENEA Thin Films Optics Lab. (Italy)


Published in SPIE Proceedings Vol. 4099:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Ghanim A. Al-Jumaily; Angela Duparre; Bhanwar Singh, Editor(s)

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