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Proceedings Paper

Advanced methods for surface and subsurface defect characterization of optical components
Author(s): Joerg Steinert; Stefan Gliech; Andreas Wuttig; Angela Duparre; Horst Truckenbrodt
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Paper Abstract

We discuss principles of optical surface quality assessment. The micro topography of well polished fused silica, CaF2 and Si surfaces was examined locally and by covering large sample areas. Power Spectral Densities (PSD) were used for consistent roughness description. Subsurface damage was detected by a modified white light interferometer technique and total scattering measurement.

Paper Details

Date Published: 2 November 2000
PDF: 9 pages
Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); doi: 10.1117/12.405829
Show Author Affiliations
Joerg Steinert, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Stefan Gliech, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Andreas Wuttig, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Angela Duparre, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Horst Truckenbrodt, Ilmenau Technical Univ. (Germany)


Published in SPIE Proceedings Vol. 4099:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Ghanim A. Al-Jumaily; Angela Duparre; Bhanwar Singh, Editor(s)

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