Share Email Print
cover

Proceedings Paper

New procedure for the optical characterization of high-quality thin films
Author(s): Salvador Bosch; Norbert Leinfellner; Etienne Quesnel; Angela Duparre; Josep Ferre-Borrull; Stefan Guenster; Detlev Ristau
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The optical characterization of materials in thin film phase is a standard task in the field of coating technology. One typical problem is the optical characterization of a single layer of material deposited on a well-known substrate. Provided the physical model considered for the modeling is correct and the available experimental date (usually spectrophotometric or ellipsometric spectra) are accurate, a precise optical characterization is quite straightforward. However, there are experimental circumstances where several samples have been coated under very well defined conditions. As when they have been obtained in the same coating run, so that no differences are expected due to the positions of each individual sample inside the chamber during the deposition process. The aim of this work is to present an improved procedure for the optical characterization of the material deposited under the very well controlled conditions explained above. The basis of our method is to use the a priori information about the identical nature of all the samples, introducing all the spectrophotometric and/or ellipsometric data available from optical properties of the layers, as compared with the separate (individual) characterization of the samples. We will illustrate our procedures for MgF2 films in the range 200-800 nm.

Paper Details

Date Published: 2 November 2000
PDF: 7 pages
Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); doi: 10.1117/12.405812
Show Author Affiliations
Salvador Bosch, Univ. de Barcelona (Spain)
Norbert Leinfellner, Univ. de Barcelona (Spain)
Etienne Quesnel, CEA-LETI (France)
Angela Duparre, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Josep Ferre-Borrull, Fraunhofer Institute for Applied Optics and Precision Engineering (Italy)
Stefan Guenster, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 4099:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Ghanim A. Al-Jumaily; Angela Duparre; Bhanwar Singh, Editor(s)

© SPIE. Terms of Use
Back to Top