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Proceedings Paper

DUV/VUV light scattering measurement of optical components for lithography applications
Author(s): Stefan Gliech; Joerg Steinert; Marcel Flemming; Angela Duparre
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Paper Abstract

This paper reports on an instrument designed to measure the total backward and forward scattering of optical components down to the DUV/VUV spectral region. The system is based on a Coblentz sphere imaging the light scattered into the backward or forward hemispheres within an angular range from 2 degree(s) to 85 degree(s) onto the detector according to ISO/DIS 13696. The equipment divides into two set-ups, one operating in air at several wavelengths from 10.6 micrometers to 193 nm, the other one working in a vacuum/nitrogen at 157 nm and 193 nm. The system is fully automated and capable of scanning large sample areas. Both a deuterium lamp and an excimer laser can be used as radiation sources at 193 nm and 157 nm. Results of measurements on fluoride multilayer coatings and CaF2 substrates are presented.

Paper Details

Date Published: 2 November 2000
PDF: 8 pages
Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); doi: 10.1117/12.405807
Show Author Affiliations
Stefan Gliech, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Joerg Steinert, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Marcel Flemming, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Angela Duparre, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 4099:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Ghanim A. Al-Jumaily; Angela Duparre; Bhanwar Singh, Editor(s)

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