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Proceedings Paper

Optical emission of plasmas in ultraviolet and infrared laser ablation of graphite by time-resolved spectroscopy
Author(s): Tatsuya Shinozaki; Toshihiko Ooie; Tetsuo Yano; Masafumi Yoneda
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Paper Abstract

The optical emission spectra of the plasma produced by infrared and ultraviolet laser ablation of graphite in a vacuum were observed. The fundamental output of an Nd: YAG laser was used as the infrared laser. The fourth harmonic output of an Nd: YAG laser and a KrF excimer laser were used as the ultraviolet lasers. The emission intensity of the ionic carbon as well as C2 and C3 from the plasma produced by the infrared laser were stronger than that produced by the UV lasers at the same fluences. The C2 and C3 emission intensities decreased rapidly with increasing the distance from the target. The emission intensity of atomic carbon at 247.8 nm from the plasma produced by the KrF excimer laser was much stronger than that produced by the other lasers at the same laser fluence, due to the wavelenght of the KrF laser being so close to that of atomic carbon's emission line as to raise its electrical state.

Paper Details

Date Published: 6 November 2000
PDF: 4 pages
Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405761
Show Author Affiliations
Tatsuya Shinozaki, Shikoku National Industrial Research Institute and Japan Science and Technology C (Japan)
Toshihiko Ooie, Shikoku National Industrial Research Institute (Japan)
Tetsuo Yano, Shikoku National Industrial Research Institute (Japan)
Masafumi Yoneda, Shikoku National Industrial Research Institute (Japan)


Published in SPIE Proceedings Vol. 4088:
First International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Koji Sugioka; Thomas W. Sigmon, Editor(s)

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