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Proceedings Paper

High-repetition-rate ArF excimer laser for microlithography
Author(s): Osamu Wakabayashi; Tatsuo Enami; Ken Ishii; Katsutomo Terashima; Yasuo Itakura; Takayuki Watanabe; Takeshi Ohta; Ayako Ohbu; Hirokazu Kubo; Hirokazu Tanaka; Satoshi Andou; Takashi Matsunga; Hiroshi Umeda; Toru Suzuki; Akira Sumitani; Hakaru Mizoguchi
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Paper Abstract

ArF excimer lasers are the light source of choice for the next generation of micro-lithographic tools enabling structures below the 130nm technology node. For these lithographic mass production lines Komatsu successfully developed an ArF excimer laser, named G20A, which has a 2kHz pulse repetition rate, 10W average power and 0.5pm (FWHM) spectral bandwidth. G20A has three significantly improved important items: (1) the high resolution line narrowing module, (2) the high power and high repetition rate solid state pulse power module, and (3) the Xe added laser gas yielding an improved overall laser performance. ArF laser spectra were determined with out newly developed high-resolution spectrometer. The instrument function of the spectrometer was measured with a 193nm coherent light source jointly developed with the University of Tokyo. The laser gas composition is one key parameter of excimer laser performance. The deteriorating effect of impurities on ArF performance is e.g. ten times larger than on KrF performance. We observed that added Xe gas, however, has a beneficial effect on the pulse energy and the energy stability at high repetition rates. Experimental results of a currently developed 4 kHz ArF laser are also reported.

Paper Details

Date Published: 6 November 2000
PDF: 4 pages
Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405749
Show Author Affiliations
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Tatsuo Enami, Komatsu Ltd. (Japan)
Ken Ishii, Komatsu Ltd. (Japan)
Katsutomo Terashima, Komatsu Ltd. (Japan)
Yasuo Itakura, Komatsu Ltd. (Japan)
Takayuki Watanabe, Komatsu Ltd. (Japan)
Takeshi Ohta, Komatsu Ltd. (Japan)
Ayako Ohbu, Komatsu Ltd. (Japan)
Hirokazu Kubo, Komatsu Ltd. (Japan)
Hirokazu Tanaka, Komatsu Ltd. (Japan)
Satoshi Andou, Komatsu Ltd. (Japan)
Takashi Matsunga, Komatsu Ltd. (Japan)
Hiroshi Umeda, Komatsu Ltd. (Japan)
Toru Suzuki, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 4088:
First International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Koji Sugioka; Thomas W. Sigmon, Editor(s)

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