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Proceedings Paper

Inorganic-organic hybrid material for lithography
Author(s): Lin Pang; Yingbai Yan; Guofan Jin; Minxian Wu
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Paper Abstract

Tetraethoxyorthosilicate and methacryloxypropyl trimethoxy silane are used to form inorganic and organic networks, respectively. Photosensitive agent is added to initiate free-radical cross-linking polymerization of unsaturated carbon bonds and thus makes the material act as a negative tone photoresist. Developed in dilute base solution, micro- optical element, such as lenses and gratings, were fabricated by contact with UV-exposure. Shrinkage effect is investigated after optical elements obtained. Compared with the mask, the spacing of the exposed areas in sol-gel film shrinks, and the shrinkage rate is about 20%.

Paper Details

Date Published: 6 November 2000
PDF: 4 pages
Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405743
Show Author Affiliations
Lin Pang, Tsinghua Univ. (China)
Yingbai Yan, Tsinghua Univ. (China)
Guofan Jin, Tsinghua Univ. (China)
Minxian Wu, Tsinghua Univ. (China)


Published in SPIE Proceedings Vol. 4088:
First International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Koji Sugioka; Thomas W. Sigmon, Editor(s)

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