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Proceedings Paper

Study on mask technology of CVD diamond thin films by RIE etching
Author(s): Chunsheng Yang; Guifu Ding; Xiang Yao; Xiaolin Zhao
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Paper Abstract

The patterning of diamond thin films by RIE etching must use hard mask. Ni and NiTi thin films are better candidate to be used as diamond mask based on mask selective ratio and patterning process. NiTi thin film mask has higher etching selective ratio than that of Ni thin film, Ni thin film plating through mask is applicable to small microstructure fabrication because of moderate etching selective ratio, accurate in dimension control and easy to make multilayer microstructure. The diamond thin film microstructure using NiTi and Ni thin film masks fabricated by RIE etching have straight line and sharp sidewall.

Paper Details

Date Published: 20 October 2000
PDF: 6 pages
Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); doi: 10.1117/12.404906
Show Author Affiliations
Chunsheng Yang, Shanghai Jiao Tong Univ. (China)
Guifu Ding, Shanghai Jiao Tong Univ. (China)
Xiang Yao, Shanghai Jiao Tong Univ. (China)
Xiaolin Zhao, Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 4230:
Micromachining and Microfabrication
Kevin H. Chau; M. Parameswaran; Francis E.H. Tay, Editor(s)

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