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Proceedings Paper

200/300-mm Micrascan IV 248-nm system for high-throughput and tight CD control applications
Author(s): Pradeep K. Govil; Javed Sumra; James G. Tsacoyeanes; Keith W. Andresen; William Dornfeld; Marie-Christine Zolcinski-Couet; Peter J. Baumgartner; Geoffrey O'Connor; Zoltan Gyarfas
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Paper Abstract

Micrascan (MS) IV is designed to provide superior Critical Dimension (CD) control & overlay performance at very high wafer throughputs for both 200 and 300mm wafers at low cost of ownership. This new system, targeted for sub-critical applications, includes SVGL's new flexible cross-performance platform and improved 0.6NA Catadioptric Projection Optics for better resolution and overlay. A new Laser Illumination System (LIS), capable of high doses at high throughput, uses a 2 kHz semi line narrowed KrF laser. SVGL has demonstrated its MS IV 248nm DUV optical design for successful insertion at the 180nm Lithography node. In this paper, modeled capabilities of SVGL's DUV optical design for both group and isolated lines will be presented. The performance potential with both conventional and enhanced illumination will be considered. Data from SVGL's Micrascan systems, illustrating Linewidth control, Depth Of Focus (DOF) performance for 180nm Group and Isolated Features, and overlay performance potential will be given. The Cross performance platform wiht its high throughput capabilities will be discussed.

Paper Details

Date Published: 20 October 2000
PDF: 14 pages
Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); doi: 10.1117/12.404856
Show Author Affiliations
Pradeep K. Govil, SVG Lithography Systems Inc. (United States)
Javed Sumra, SVG Lithography Systems Inc. (United States)
James G. Tsacoyeanes, SVG Lithography Systems Inc. (United States)
Keith W. Andresen, SVG Lithography Systems Inc. (United States)
William Dornfeld, SVG Lithography Systems Inc. (United States)
Marie-Christine Zolcinski-Couet, SVG Lithography Systems Inc. (United States)
Peter J. Baumgartner, SVG Lithography Systems Inc. (United States)
Geoffrey O'Connor, SVG Lithography Systems Inc. (United States)
Zoltan Gyarfas, SVG Lithography Systems Inc. (United States)


Published in SPIE Proceedings Vol. 4226:
Microlithographic Techniques in Integrated Circuit Fabrication II
Chris A. Mack; XiaoCong Yuan, Editor(s)

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