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Proceedings Paper

Simulation of resolution enhancement in contact lithography by off-axis illumination
Author(s): Yongkai Zhao; Huijie Huang; Dunwu Lu; Longlong Du; Cailai Yuan; Baocai Jiang; Runwen Wang
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Paper Abstract

Intensity distribution on the wafer plane in contact printing system under off-axis illumination is derived based on the amplitude analytic expression for Fresnel-Kirchhoff diffraction. Numerical simulations have been done under various conditions. Resolution enhancement effects by off-axis illumination and its application are analyzed.

Paper Details

Date Published: 20 October 2000
PDF: 4 pages
Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); doi: 10.1117/12.404850
Show Author Affiliations
Yongkai Zhao, Shanghai Institute of Optics and Fine Mechanics (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Dunwu Lu, Shanghai Institute of Optics and Fine Mechanics (China)
Longlong Du, Shanghai Institute of Optics and Fine Mechanics (China)
Cailai Yuan, Shanghai Institute of Optics and Fine Mechanics (China)
Baocai Jiang, Shanghai Institute of Optics and Fine Mechanics (China)
Runwen Wang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 4226:
Microlithographic Techniques in Integrated Circuit Fabrication II

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