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Proceedings Paper

Effect of electrostatic field on photoresist coating uniformity
Author(s): Wenzhan Zhou
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Paper Abstract

As the critical feature decreases below 0.25micrometers in the manufacture of integrated circuits, the control of photoresist coating uniformity becomes more critical to the overall critical dimension control. Normally, the thickness uniformity of photoresist coated by spinning is mainly affected by resist viscosity, solvent evaporation rate, dispense speed, exhaust humidity, wind speed and resist (substrate) temperature. However what we observed on our manufacturing line revealed that electrostatic field induced by piezocrystal also impacted on thickness uniformity of photoresist. Two possible explanations of this phenomena will be given in this paper. Though there is still not final solution to this problem, we propose track and resist designer to take this issue into consideration to improve the photoresist spin coating uniformity.

Paper Details

Date Published: 20 October 2000
PDF: 8 pages
Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); doi: 10.1117/12.404845
Show Author Affiliations
Wenzhan Zhou, Chartered Semiconductor Manufacturing, Ltd. (Singapore)

Published in SPIE Proceedings Vol. 4226:
Microlithographic Techniques in Integrated Circuit Fabrication II
Chris A. Mack; XiaoCong Yuan, Editor(s)

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