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Proceedings Paper

Overview of reticle enhancement technology software strategy
Author(s): Alfred J. Reich; R. D. Jarvis; Steve Talent; Renee Carter
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Paper Abstract

Although RET software technology has made great advances in recent years, very little attention has been paid to how this technology can be put into reliable and efficient use in a production environment. To stimulate EDA suppliers to take up this task, a system for not only automating RET, but also for generalizing the automation of RET is described.

Paper Details

Date Published: 20 October 2000
PDF: 6 pages
Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); doi: 10.1117/12.404842
Show Author Affiliations
Alfred J. Reich, Motorola (United States)
R. D. Jarvis, Motorola (United States)
Steve Talent, Motorola (United States)
Renee Carter, Motorola (United States)


Published in SPIE Proceedings Vol. 4226:
Microlithographic Techniques in Integrated Circuit Fabrication II
Chris A. Mack; XiaoCong Yuan, Editor(s)

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