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Proceedings Paper

Spectral-sensitive on-chip masking of Si-PIN-diodes using patterned and self-blocked optical coatings
Author(s): Uwe B. Schallenberg; Stefan Jakobs; Wolfgang Buss
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Paper Abstract

The manufacturing processes for spectral-sensitive on-chip masking of Si-PIN-diodes using thin-film optical filters are described. As two examples, a diode array with red, green, and blue filters (RGB) and a UV-sensitive diode are explained in detail. The RGB-filters are made of TiO2SiO2 thin-films and the UV-filter is a metal/dielectric multilayer using HfO2, SiO2, and Al thin-films. Both filter types are self-blocked over a wavelength range from 200 to 1100nm. The optical coatings on the diodes are arranged as pixels with rhombic or rectangular shapes and with a later dimensions of about 20 microns as minimum. The used lift-off technique for patterning the coatings is described briefly. Reactive e-beam evaporation with ion-assistance is used to deposit the optical coatings.

Paper Details

Date Published: 19 October 2000
PDF: 6 pages
Proc. SPIE 4094, Optical and Infrared Thin Films, (19 October 2000); doi: 10.1117/12.404753
Show Author Affiliations
Uwe B. Schallenberg, mso jena Mikroschichtoptik GmbH (Germany)
Stefan Jakobs, mso jena Mikroschichtoptik GmbH (Germany)
Wolfgang Buss, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 4094:
Optical and Infrared Thin Films
Michael L. Fulton, Editor(s)

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