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Proceedings Paper

Design of the deeply etched binary optics even device for the exposure system of the quasimolecule laser
Author(s): Ping Xu; Yiling Sun; Jingzhen Li
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Paper Abstract

In this paper, the new binary optical even device is presented. Whose phase depth exceeded 2(pi) . This device has the characteristics of less weight, convenient adjusting, high utilization rate of energy and well- distributed light beam, which can be used in quasi-molecule laser exposure system.

Paper Details

Date Published: 11 October 2000
PDF: 5 pages
Proc. SPIE 4224, Biomedical Photonics and Optoelectronic Imaging, (11 October 2000); doi: 10.1117/12.403986
Show Author Affiliations
Ping Xu, Shenzhen Univ. (China)
Yiling Sun, Shenzhen Univ. (China)
Jingzhen Li, Shenzhen Univ. (China)

Published in SPIE Proceedings Vol. 4224:
Biomedical Photonics and Optoelectronic Imaging
Hong Liu; Qingming Luo, Editor(s)

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