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Proceedings Paper

Evaluation of an optical surface using nanometrology in optical manufacturing technology
Author(s): Jianbai Li; Anqing Zhao; Xiaoyun Li; Xiaoli Zhang; Ming Wang
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Paper Abstract

In this paper, a testing method for optical polished surface in level instrumentation using Atomic Force microscope (AFM) is presented, and some results reached to nanmometer RMS are listed. In the paper it is indicated that different size of polished platforms are formed as difference of optical polished method and period. This research has important significance for improving optical polishing technology and obtaining supersmooth polishing surface.

Paper Details

Date Published: 6 October 2000
PDF: 3 pages
Proc. SPIE 4231, Advanced Optical Manufacturing and Testing Technology 2000, (6 October 2000); doi: 10.1117/12.402847
Show Author Affiliations
Jianbai Li, Jiangxi Academy of Sciences (China)
Anqing Zhao, Jiangxi Academy of Sciences (China)
Xiaoyun Li, Jiangxi Academy of Sciences (China)
Xiaoli Zhang, Jiangxi Academy of Sciences (China)
Ming Wang, Nanchang Univ. (China)

Published in SPIE Proceedings Vol. 4231:
Advanced Optical Manufacturing and Testing Technology 2000
Li Yang; Harvey M. Pollicove; Qiming Xin; James C. Wyant, Editor(s)

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