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Proceedings Paper

Large-area gratings fabricated by ultrafast e-beam writing
Author(s): Ernst-Bernhard Kley; T. Clausnitzer; Matthias Cumme; Karsten Zoellner; Bernd Schnabel; A. Stich
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Paper Abstract

To realize a well defined binary grating (for grating originals as well as grating masks), it is helpful to use a rectangular resist profile because of the importance of the fill factor. This can be achieved easier by e-beam writing than by holography. On the opposite, well-known handicaps of e-beam writing are large writing times and grating ghosts (caused e.g. by stitching errors). We fabricated chromium grating masks (period 500 nm, size 100 mm x 100 mm) by an extremely fast and specialized e-beam direct writing process. The typical and critical parameters, like fill factor and wave front, were locally measured in the whole grating area. The paper will show the method of e-beam writing and the results of lateral grating quality. The remaining errors are separated in problems caused by the writing process and in problems related to resist technology and etching process.

Paper Details

Date Published: 6 October 2000
PDF: 10 pages
Proc. SPIE 4231, Advanced Optical Manufacturing and Testing Technology 2000, (6 October 2000); doi: 10.1117/12.402775
Show Author Affiliations
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
T. Clausnitzer, Friedrich-Schiller-Univ. Jena (Germany)
Matthias Cumme, Friedrich-Schiller-Univ. Jena (Germany)
Karsten Zoellner, Friedrich-Schiller-Univ. Jena (Germany)
Bernd Schnabel, Leica Microsystems Lithography GmbH (Germany)
A. Stich, Leica Microsystems Lithography GmbH (Germany)

Published in SPIE Proceedings Vol. 4231:
Advanced Optical Manufacturing and Testing Technology 2000
Li Yang; Harvey M. Pollicove; Qiming Xin; James C. Wyant, Editor(s)

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