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Proceedings Paper

Submicron electro-optic measurement technique using an external hemispherical probe
Author(s): Zhanguo Chen; Gang Jia; Zhifa Wu; Yunlong Liu; Chao Zhao; Maobin Yi
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Paper Abstract

In this paper an external electro-optic measuring system based on a hemispherical GaAs probe is presented. By using the system, the electrical signals propagating on a microstrip transmission line are successfully measured. The spatial resolution of the system, which is limited by the focused probing spot size, is about 0.5 micrometers , when the wavelength of the probing beam is 1.3 micrometers .

Paper Details

Date Published: 9 October 2000
PDF: 4 pages
Proc. SPIE 4221, Optical Measurement and Nondestructive Testing: Techniques and Applications, (9 October 2000); doi: 10.1117/12.402615
Show Author Affiliations
Zhanguo Chen, Jilin Univ. (China)
Gang Jia, Jilin Univ. (China)
Zhifa Wu, Jilin Univ. (China)
Yunlong Liu, Jilin Univ. (China)
Chao Zhao, Jilin Univ. (China)
Maobin Yi, Jilin Univ. (China)


Published in SPIE Proceedings Vol. 4221:
Optical Measurement and Nondestructive Testing: Techniques and Applications
FeiJun Song; Frank Chen; Michael Y.Y. Hung; H.M. Shang, Editor(s)

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