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Proceedings Paper

Method of microlens array fabricated by inorganic photoresist
Author(s): Changtai Yu; Hong Zhang; Fangfu Guo; Ying Chen; Jianjun Wu; Hua Yu
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Paper Abstract

It has been shown that it is possible to fabricate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited in our laboratory is suitable to be exposed by Electron Beam (EBE) or X-Ray. We have obtained the lithophotography pattern with 0.6 micrometers line width by EGE exposure. Because the resist pattern will not swell and distort during the processing, there is no problem of shelf life. We have made lenses with diameter from 0.8 mm to 1.0 mm, in the form of spheres, and have studied their optical properties.

Paper Details

Date Published: 2 October 2000
PDF: 2 pages
Proc. SPIE 4092, Novel Optical Systems Design and Optimization III, (2 October 2000); doi: 10.1117/12.402421
Show Author Affiliations
Changtai Yu, Zhejiang Univ. (China)
Hong Zhang, Zhejiang Univ. (China)
Fangfu Guo, Zhejiang Univ. (China)
Ying Chen, Zhejiang Univ. (China)
Jianjun Wu, Zhejiang Univ. (China)
Hua Yu, Cymer Corp. (United States)


Published in SPIE Proceedings Vol. 4092:
Novel Optical Systems Design and Optimization III
Jose M. Sasian, Editor(s)

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