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Proceedings Paper

AFM data analysis: separating surface microtopography from instrumental artifacts
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Paper Abstract

It is well known that functional surfaces in microelectronics and optics can be inspected very fast with scatterometers or scatter sensors. However, there is an increasing interest in looking at specific sample areas in more detail, i.e., the micro topography of the surface has to be measured. Since far-field optical profilers are diffraction limited, the means of choice are very often Scanning Probem Microscopes (SPMs), and namely, Atomic Force Microscopes (AFMs). Various methods for processing data obtained by AFMs will be discussed. An AFM measurement should deliver the surface micro topography to enable the determination of characteristic values, in particular rms roughness. Normally, a superposition of the surface characteristics and artifacts due to the AFM is obtained.

Paper Details

Date Published: 26 September 2000
PDF: 11 pages
Proc. SPIE 4100, Scattering and Surface Roughness III, (26 September 2000); doi: 10.1117/12.401656
Show Author Affiliations
Dorothee Hueser, Univ. of the Federal Armed Forces (Germany)
Hendrik Rothe, Univ. of the Federal Armed Forces (Germany)

Published in SPIE Proceedings Vol. 4100:
Scattering and Surface Roughness III
Zu-Han Gu; Alexei A. Maradudin, Editor(s)

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