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Proceedings Paper

Nanostructure fabrication process for optoelectronic applications
Author(s): Alexei A. Malinin; Victor F. Ovchinnikov; Tero H. Toivola; Charlotta J.-J. Tuovinen
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Paper Abstract

Silicon nanostructures present a new class of material systems that possess electrical and optical properties different from bulk and conventional thin film structures. We present a fabrication process for devices based on silicon nanopillars. The pillars were obtained by means of self-organized gold-chromium and polystyrene sphere masks and reactive ion etching of silicon. The evolution of pillar shape during reactive ion etching was observed by scanning electron microscopy and explained by combined effect of backscattering and polymerization.

Paper Details

Date Published: 29 September 2000
PDF: 11 pages
Proc. SPIE 4098, Optical Devices and Diagnostics in Materials Science, (29 September 2000); doi: 10.1117/12.401645
Show Author Affiliations
Alexei A. Malinin, Helsinki Univ. of Technology (Finland)
Victor F. Ovchinnikov, Helsinki Univ. of Technology (Finland)
Tero H. Toivola, Helsinki Univ. of Technology (Finland)
Charlotta J.-J. Tuovinen, Helsinki Univ. of Technology (Finland)


Published in SPIE Proceedings Vol. 4098:
Optical Devices and Diagnostics in Materials Science
David L. Andrews; Toshimitsu Asakura; Suganda Jutamulia; Wiley P. Kirk; Max G. Lagally; Ravindra B. Lal; James D. Trolinger; David L. Andrews, Editor(s)

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