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Proceedings Paper

Fabrication by wet etching of multilayer GaAIAs/GaAs microtips for SNOM applications
Author(s): Christophe Gorecki; Sabry Khalfallah; Hideki Kawakatsu; Yasuhiko Arakawa
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Paper Abstract

We propose to fabricate GaAlAs/GaAs multi-layer microtips for scanning near-field optical microscope using the anisotropic etching. The etching was performed in a solution of H3PO4:H2O2:H2O, operating at the temperature of 10 degree(s)C. We obtained the pyramid-shaped microtips with four etched facets and with a radius of curvature at the apex lower than 50 nm.

Paper Details

Date Published: 29 September 2000
PDF: 4 pages
Proc. SPIE 4098, Optical Devices and Diagnostics in Materials Science, (29 September 2000); doi: 10.1117/12.401622
Show Author Affiliations
Christophe Gorecki, Univ. de Franche-Comte (France)
Sabry Khalfallah, Univ. of Tokyo (Japan)
Hideki Kawakatsu, Univ. of Tokyo (Japan)
Yasuhiko Arakawa, Univ. of Tokyo (Japan)


Published in SPIE Proceedings Vol. 4098:
Optical Devices and Diagnostics in Materials Science
David L. Andrews; David L. Andrews; Toshimitsu Asakura; Suganda Jutamulia; Wiley P. Kirk; Max G. Lagally; Ravindra B. Lal; James D. Trolinger, Editor(s)

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